Plasmachemical Removal of Corrosion Layers from Brass

Plasmachemical Removal of Corrosion Layers from Brass

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Influence of RF low-pressure hydrogen plasma on corroded brass samples was investigated. OH radicals formed during this process were measured by optical emission spectroscopy; simultaneously, sample temperature was measured by a thermocouple. The value of integral intensity of OH radicals represented quantitative ablation of oxygen from a corrosion layer. Sample temperature was an important indicator of sample protection against metallographic changes. It was proved that both hydrogen atom reduction and thermal decomposition were employed in the removal process.

Influence of RF low-pressure hydrogen plasma on corroded brass samples was investigated. OH radicals formed during this process were measured by optical emission spectroscopy; simultaneously, sample temperature was measured by a thermocouple. The value of integral intensity of OH radicals represented quantitative ablation of oxygen from a corrosion layer. Sample temperature was an important indicator of sample protection against metallographic changes. It was proved that both hydrogen atom reduction and thermal decomposition were employed in the removal process.

RF low-pressure hydrogen plasma, brass corrosion, atomic hydrogen

RF low-pressure hydrogen plasma, brass corrosion, atomic hydrogen

KRČMA, F.; MAZÁNKOVÁ, V.; SÁZAVSKÁ, V.; ŘÁDKOVÁ, L.

2013

10.07.2012

EPS

Lisbon

2-914771-74-6

Europhysics Conference Abstracts

P2.3.31

P2.3.32

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