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SOLOVEI, D.; HUBALEK, J.; MOZALEV, A.
Originální název
The growth and dielectric properties of porous-anodic-alumina-supported nanostructured Ta2O5/Ta films
Anglický název
Druh
Abstrakt
Originální abstrakt
Amorphous tantalum pentoxide, grown on sintered tantalum powders or microstructured conducting substrates, has been of interest as a metal/oxide electrode with significantly increased overall surface area. Aiming at potential application to capacitors, we propose an advanced approach to fabricate Ta2O5/Ta films with highly porous nanostructured morphology and large surface-to-volume ratio via electrochemical anodizing of tantalum layers sputter-deposited over the nanoporous alumina substrates
Anglický abstrakt
Klíčová slova
anodizing, capacitor, tantalum oxide, nanostructure
Klíčová slova v angličtině
Autoři
Rok RIV
2013
Vydáno
19.08.2012
Nakladatel
ISE
Místo
Prague, Czech Republic
Kniha
63rd Annual Meeting of the International Society of Electrochemistry (ISE2012)
Strany od
1
Strany do
Strany počet
BibTex
@misc{BUT96827, author="Dmitry {Solovei} and Jaromír {Hubálek} and Alexander {Mozalev}", title="The growth and dielectric properties of porous-anodic-alumina-supported nanostructured Ta2O5/Ta films", booktitle="63rd Annual Meeting of the International Society of Electrochemistry (ISE2012)", year="2012", pages="1--1", publisher="ISE", address="Prague, Czech Republic", note="Abstract" }