Detail publikačního výsledku

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

Originální název

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

Anglický název

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Anglický abstrakt

Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Klíčová slova

PECVD, HMDSO, thin layers, barriere properties

Klíčová slova v angličtině

PECVD, HMDSO, thin layers, barriere properties

Autoři

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

Rok RIV

2013

Vydáno

10.07.2012

Nakladatel

EPS

Místo

Lisbon

ISBN

2-914771-74-6

Kniha

Europhysics Conference Abstracts

Strany od

P3.5.71

Strany do

P3.5.72

Strany počet

2