Detail publikačního výsledku

Contribution to modeling of stressing in microelectronic structures

PULEC, J.; SZENDIUCH, I.

Originální název

Contribution to modeling of stressing in microelectronic structures

Anglický název

Contribution to modeling of stressing in microelectronic structures

Druh

Abstrakt

Originální abstrakt

Topic of my article is modeling of thermomechanical stressing in modern microelectronic structures. Simulations are made using software ANSYS, which is based on Finite Element Method (FEM). Using this method, thermomechanical stressing in various structures was modeled. After simulations, data evaluation and comparison of yielded results was made to determine amplitudes and differences between stressing in various regions of modeled structure and between individual structures.

Anglický abstrakt

Topic of my article is modeling of thermomechanical stressing in modern microelectronic structures. Simulations are made using software ANSYS, which is based on Finite Element Method (FEM). Using this method, thermomechanical stressing in various structures was modeled. After simulations, data evaluation and comparison of yielded results was made to determine amplitudes and differences between stressing in various regions of modeled structure and between individual structures.

Klíčová slova

ANSYS, Stressing, 3D Structures

Klíčová slova v angličtině

ANSYS, Stressing, 3D Structures

Autoři

PULEC, J.; SZENDIUCH, I.

Rok RIV

2011

Vydáno

12.05.2010

Nakladatel

Oficyna Wydawnicza Politechniki Warszawskiej

Místo

Warsaw, Poland

ISBN

978-83-7207-870-4

Kniha

Abstract proceedings. Polymer Electronics and Nanotechnologies: towards System Integration.

Strany od

218

Strany do

219

Strany počet

2

BibTex

@misc{BUT61078,
  author="Jiří {Pulec} and Ivan {Szendiuch}",
  title="Contribution to modeling of stressing in microelectronic structures",
  booktitle="Abstract proceedings. Polymer Electronics and Nanotechnologies: towards System Integration.",
  year="2010",
  edition="1",
  pages="218--219",
  publisher="Oficyna Wydawnicza Politechniki Warszawskiej",
  address="Warsaw, Poland",
  isbn="978-83-7207-870-4",
  note="Abstract"
}