Detail publikačního výsledku

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

OHLÍDAL, M.; OHLÍDAL, I.; KLAPETEK, P.; NEČAS, D.

Originální název

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

Anglický název

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

Druh

Abstrakt

Originální abstrakt

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.

Anglický abstrakt

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.

Klíčová slova

Thin films, optical parameters

Klíčová slova v angličtině

Thin films, optical parameters

Autoři

OHLÍDAL, M.; OHLÍDAL, I.; KLAPETEK, P.; NEČAS, D.

Rok RIV

2010

Vydáno

29.06.2008

Nakladatel

Trinity College Dublin

Místo

Dublin

Strany od

M-P43

Strany do

M-P43

Strany počet

1