Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers

Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers

Článek recenzovaný mimo WoS a Scopus

TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.

TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.

photoctalytic degradation, formic acid

photoctalytic degradation, formic acid

CHOMOUCKÁ, J.; DZIK, P.; VESELÝ, M.; DRBOHLAVOVÁ, J.

2010

09.09.2008

ČSCH

Praha

1213-7103

CHEMICKE LISTY

102

15

Česká republika

s986

s988

3

http://www.chemicke-listy.cz/docs/full/2008_15_s983-s1071.pdf