Detail publikačního výsledku

Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

ZUPPELLA, P. -LUCIANI, D. -TUCCERI, P. -DeMARCO, P. -GAUDIERI, A. -KAISER, J. -OTTAVIANO, L. -SANTUCCI, S. -REALE, A.

Originální název

Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

Anglický název

Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.

Anglický abstrakt

A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.

Klíčová slova

XUV interference litography, capillary-discharge based table-top source

Klíčová slova v angličtině

XUV interference litography, capillary-discharge based table-top source

Autoři

ZUPPELLA, P. -LUCIANI, D. -TUCCERI, P. -DeMARCO, P. -GAUDIERI, A. -KAISER, J. -OTTAVIANO, L. -SANTUCCI, S. -REALE, A.

Rok RIV

2010

Vydáno

24.02.2009

Nakladatel

IOP PUBLISHING

ISSN

0957-4484

Periodikum

NANOTECHNOLOGY

Svazek

20

Číslo

2

Stát

Spojené království Velké Británie a Severního Irska

Strany od

115303

Strany do

115307

Strany počet

4

BibTex

@article{BUT48533,
  author="Jozef {Kaiser}",
  title="Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence",
  journal="NANOTECHNOLOGY",
  year="2009",
  volume="20",
  number="2",
  pages="115303--115307",
  issn="0957-4484"
}