Detail publikačního výsledku

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.

Originální název

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Anglický název

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.

Anglický abstrakt

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.

Klíčová slova

Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization

Klíčová slova v angličtině

Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization

Autoři

ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.

Rok RIV

2010

Vydáno

22.12.2008

ISSN

0257-8972

Periodikum

SURFACE & COATINGS TECHNOLOGY

Svazek

202

Číslo

22

Stát

Švýcarská konfederace

Strany od

5572

Strany do

5575

Strany počet

4

BibTex

@article{BUT48292,
  author="Vladimír {Čech} and Jan {Studýnka} and Božena {Čechalová} and Jan {Mistrík} and Josef {Zemek}",
  title="Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD",
  journal="SURFACE & COATINGS TECHNOLOGY",
  year="2008",
  volume="202",
  number="22",
  pages="5572--5575",
  issn="0257-8972"
}