Detail publikace

Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence

Samek O, Leis F, Margetic V, Malina R, Niemax K, Hergenroder R

Originální název

Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Planar laser-induced fluorescence measurements were used to investigate the expansion dynamics of a femtosecond laser-induced plasma. Temporally and spatially resolved measurements were performed to monitor the atoms that were ablated from a silicon target. A dye laser (lambda = 288.16 nm) was used to excite fluorescence signals. The radiation of an off-resonant transition (Si 390.55 nm) was observed at different distances from the target surface. This allowed easy detection of the ablated Si atoms without problems caused by scattered laser light. Abel inversion was applied to obtain the radial distribution of the Si atoms. The atom distribution in the plasma shows some peculiarities, depending on the crater depth. (C) 2003 Optical Society of America.

Klíčová slova

ABLATED COPPER, INDUCED BREAKDOWN, PLUME, EMISSION, GAS, SPECTROSCOPY, EXCITATION, DEPOSITION, CU-2, SI

Autoři

Samek O, Leis F, Margetic V, Malina R, Niemax K, Hergenroder R

Rok RIV

2003

Vydáno

20. 10. 2003

ISSN

0003-6935

Periodikum

Applied Optics

Ročník

42

Číslo

30

Stát

Spojené státy americké

Strany od

6001

Strany do

6005

Strany počet

5

BibTex

@article{BUT42060,
  author="Ota {Samek} and Radomír {Malina}",
  title="Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence",
  journal="Applied Optics",
  year="2003",
  volume="42",
  number="30",
  pages="5",
  issn="0003-6935"
}