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Detail publikačního výsledku
Samek O, Leis F, Margetic V, Malina R, Niemax K, Hergenroder R
Originální název
Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence
Anglický název
Druh
Článek recenzovaný mimo WoS a Scopus
Originální abstrakt
Planar laser-induced fluorescence measurements were used to investigate the expansion dynamics of a femtosecond laser-induced plasma. Temporally and spatially resolved measurements were performed to monitor the atoms that were ablated from a silicon target. A dye laser (lambda = 288.16 nm) was used to excite fluorescence signals. The radiation of an off-resonant transition (Si 390.55 nm) was observed at different distances from the target surface. This allowed easy detection of the ablated Si atoms without problems caused by scattered laser light. Abel inversion was applied to obtain the radial distribution of the Si atoms. The atom distribution in the plasma shows some peculiarities, depending on the crater depth. (C) 2003 Optical Society of America.
Anglický abstrakt
Klíčová slova
ABLATED COPPER, INDUCED BREAKDOWN, PLUME, EMISSION, GAS, SPECTROSCOPY, EXCITATION, DEPOSITION, CU-2, SI
Klíčová slova v angličtině
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Rok RIV
2011
Vydáno
20.10.2003
ISSN
0003-6935
Periodikum
Applied Optics
Svazek
42
Číslo
30
Stát
Spojené státy americké
Strany od
6001
Strany počet
5
BibTex
@article{BUT42060, author="Ota {Samek} and Radomír {Malina}", title="Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence", journal="Applied Optics", year="2003", volume="42", number="30", pages="5", issn="0003-6935" }