Detail publikace

Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

EL HAMMOUMI, M. CHAUDHARY, V. NEUGEBAUER, P. EL FATIMY, A.

Originální název

Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

The rapidly growing demand for high-performance and low-power electronic and photonic devices has driven attention towards novel two-dimensional (2D) layered materials. In this regard, 2D layered materials, including graphene, molybdenum disulfide (MoS2), and newly discovered phosphorene, have the potential to take over the existing semiconductor industry due to their intriguing features, such as excellent electrical conductivity, strong light-matter interaction, and especially the ability to scale down the resulting device to the atomic level. However, to explore the full potential of these materials in various technological applications, it is essential to develop a large-scale synthesis method that can provide uniform, defect-free thin film. The chemical vapor deposition (CVD) technique has been proven to produce large-scale and less defective 2D crystals with reasonably good quality and uniformity compared to other elaboration techniques, such as molecular beam epitaxy. This article discusses whether CVD may improve 2D layered materials growth, including graphene and MoS2, and whether it can be used to grow phosphorene. Only a few attempts have been made using CVD-like methods to grow phosphorene directly on the substrate. Still, one has to go long to establish a proper CVD method for phosphorene synthesis.

Klíčová slova

2D materials; CVD; graphene; MoS2; black phosphorus; phosphorene

Autoři

EL HAMMOUMI, M.; CHAUDHARY, V.; NEUGEBAUER, P.; EL FATIMY, A.

Vydáno

24. 11. 2022

Nakladatel

IOP Publishing Ltd

Místo

BRISTOL

ISSN

1361-6463

Periodikum

Journal of Physics D - Applied Physics

Ročník

55

Číslo

47

Stát

Spojené království Velké Británie a Severního Irska

Strany počet

18

URL

https://iopscience.iop.org/article/10.1088/1361-6463/ac928d

Plný text v Digitální knihovně

http://hdl.handle.net/11012/209153

BibTex

@article{BUT182303,
  author="Mohammed {El Hammoumi} and Vivek {Chaudhary} and Petr {Neugebauer} and Abdelouahad {El Fatimy}",
  title="Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials",
  journal="Journal of Physics D - Applied Physics",
  year="2022",
  volume="55",
  number="47",
  pages="18",
  doi="10.1088/1361-6463/ac928d",
  issn="1361-6463",
  url="https://iopscience.iop.org/article/10.1088/1361-6463/ac928d"
}