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Detail publikačního výsledku
Přikryl, R., Čech, V., Hedbavny, P.
Originální název
Capacitive coupling plasma system for thin film deposition
Anglický název
Druh
Stať ve sborníku v databázi WoS či Scopus
Originální abstrakt
Plasma polymerization is a powerful tool for deposition of thin films whose physicochemical properties can be controlled in wide ranges and thus the technology enables tailoring of the material with respect to an application. However, a success of the coating technique depends on a suitable technological system, as the vacuum quality and film reproducibility are the crucial parameters. We have developed a new capacitive coupling system for creative design and application of complex film systems in smart materials. The internal setup of our deposition chamber using plan-parallel electrodes was derived from a typical capacitive coupling system, but our apparatus was equipped with many non-standard components.
Anglický abstrakt
Klíčová slova
PECVD, plasma technology, capacitive coupling system
Klíčová slova v angličtině
Autoři
Vydáno
01.01.2004
Místo
Turecko
Kniha
Plasma Polymers and Related Materials
Strany od
1
Strany počet
4
BibTex
@inproceedings{BUT17609, author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny}", title="Capacitive coupling plasma system for thin film deposition", booktitle="Plasma Polymers and Related Materials", year="2004", pages="4", address="Turecko" }