Detail publikačního výsledku

Hiding e-beam exposure fields by deterministic 2D pattering

HORÁČEK, M.; KNÁPEK, A.; MATĚJKA, M.; KRÁTKÝ, S.; URBÁNEK, M.; MIKA, F.; KOLAŘÍK, V.;

Originální název

Hiding e-beam exposure fields by deterministic 2D pattering

Anglický název

Hiding e-beam exposure fields by deterministic 2D pattering

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief. Recently, we presented a method that makes use of e–beam exposure imperfection by introducing marginally visible high–frequency diffraction gratings of variable pitch that fill in separate orthogonal exposure fields. The actually presented approach follows up our research on aperiodic arrangements of optical primitives, especially on the phyllotactic– like arrangement of sub–micron relief optical elements. This approach is extended from the diffraction element arrangement to the higher level of exposure fields arrangements.

Anglický abstrakt

The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief. Recently, we presented a method that makes use of e–beam exposure imperfection by introducing marginally visible high–frequency diffraction gratings of variable pitch that fill in separate orthogonal exposure fields. The actually presented approach follows up our research on aperiodic arrangements of optical primitives, especially on the phyllotactic– like arrangement of sub–micron relief optical elements. This approach is extended from the diffraction element arrangement to the higher level of exposure fields arrangements.

Klíčová slova

phyllotaxis, electron beam lithography

Klíčová slova v angličtině

phyllotaxis, electron beam lithography

Autoři

HORÁČEK, M.; KNÁPEK, A.; MATĚJKA, M.; KRÁTKÝ, S.; URBÁNEK, M.; MIKA, F.; KOLAŘÍK, V.;

Vydáno

04.06.2018

ISBN

978-80-87441-23-7

Kniha

Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar.

Strany od

36

Strany do

36

Strany počet

1

BibTex

@inproceedings{BUT165267,
  author="HORÁČEK, M. and KNÁPEK, A. and MATĚJKA, M. and KRÁTKÝ, S. and URBÁNEK, M. and MIKA, F. and KOLAŘÍK, V.",
  title="Hiding e-beam exposure fields by deterministic 2D pattering",
  booktitle="Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar.",
  year="2018",
  pages="36--36",
  isbn="978-80-87441-23-7"
}