Detail publikačního výsledku

Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

KRUMPOLEC, R.; HOMOLA, T.; CAMERON, D.; HUMLÍČEK, J.; CAHA, O.; KULDOVÁ, K.; ZAZPE MENDIOROZ, R.; PŘIKRYL, J.; MACÁK, J.

Originální název

Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Anglický název

Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Druh

Článek WoS

Originální abstrakt

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

Anglický abstrakt

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

Klíčová slova

vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure

Klíčová slova v angličtině

vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure

Autoři

KRUMPOLEC, R.; HOMOLA, T.; CAMERON, D.; HUMLÍČEK, J.; CAHA, O.; KULDOVÁ, K.; ZAZPE MENDIOROZ, R.; PŘIKRYL, J.; MACÁK, J.

Rok RIV

2019

Vydáno

01.10.2018

Nakladatel

MDPI

ISSN

2079-6412

Periodikum

Coatings, MDPI

Svazek

8

Číslo

10

Stát

Švýcarská konfederace

Strany od

1

Strany do

16

Strany počet

16

URL

http://www.mdpi.com/2079-6412/8/10/369

Plný text v Digitální knihovně

http://hdl.handle.net/11012/195621

BibTex

@article{BUT150687,
  author="Richard {Krumpolec} and Tomáš {Homola} and David Campbell {Cameron} and Josef {Humlíček} and Ondřej {Caha} and Karla {Kuldová} and Raúl {Zazpe Mendioroz} and Jan {Přikryl} and Jan {Macák}",
  title="Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition",
  journal="Coatings, MDPI",
  year="2018",
  volume="8",
  number="10",
  pages="1--16",
  doi="10.3390/coatings8100369",
  issn="2079-6412",
  url="http://www.mdpi.com/2079-6412/8/10/369"
}

Dokumenty

coatings-08-00369-v2