Detail publikačního výsledku

Calibration of the Deflection Field of the Lithograph Using SEM Mode

DANĚK, L.

Originální název

Calibration of the Deflection Field of the Lithograph Using SEM Mode

Anglický název

Calibration of the Deflection Field of the Lithograph Using SEM Mode

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

A new method for the calibration of geometric distortion of deflection field is presented. This method uses a regime of scanning electron microscope (SEM), which was added to electron beam lithographs BS600 and BS601 in project ELITO. The main advantage of this method was the reduction of the time required to calibrate the lithograph.

Anglický abstrakt

A new method for the calibration of geometric distortion of deflection field is presented. This method uses a regime of scanning electron microscope (SEM), which was added to electron beam lithographs BS600 and BS601 in project ELITO. The main advantage of this method was the reduction of the time required to calibrate the lithograph.

Klíčová slova v angličtině

E-Beam Lithography

Autoři

DANĚK, L.

Vydáno

29.04.2004

Nakladatel

VUT v Brně

Místo

Brno

ISBN

80-214-2636-5

Kniha

10. konference EEICT

Svazek

2004

Strany od

570

Strany počet

5

BibTex

@inproceedings{BUT13489,
  author="Lukáš {Daněk}",
  title="Calibration of the Deflection Field of the Lithograph Using SEM Mode",
  booktitle="10. konference EEICT",
  year="2004",
  volume="2004",
  pages="5",
  publisher="VUT v Brně",
  address="Brno",
  isbn="80-214-2636-5"
}