Detail publikace
Modeling C-AFM measurement using FEM
MARTINEK, J. ŠLESINGER, R. KLAPETEK, P.
Originální název
Modeling C-AFM measurement using FEM
Anglický název
Modeling C-AFM measurement using FEM
Jazyk
en
Originální abstrakt
The presented work describes a finite element method based modeling of a conductive AFM measurement process. The C-AFM is a scanning probe microscopy technique for mapping electrical properties of a sample together with its topography. The contact resistance between the probe and the rough surface is modeled in two steps - first the problem of mechanical deformation is solved and then the electrical field, and current, is found. The geometry of the model comes from a real sample topography measured using AFM. The whole multiphysics 3D simulation is done for each data point, which makes the problem possible to be solved only using a supercomputer with many simplifications and optimizations.
Anglický abstrakt
The presented work describes a finite element method based modeling of a conductive AFM measurement process. The C-AFM is a scanning probe microscopy technique for mapping electrical properties of a sample together with its topography. The contact resistance between the probe and the rough surface is modeled in two steps - first the problem of mechanical deformation is solved and then the electrical field, and current, is found. The geometry of the model comes from a real sample topography measured using AFM. The whole multiphysics 3D simulation is done for each data point, which makes the problem possible to be solved only using a supercomputer with many simplifications and optimizations.
Dokumenty
BibTex
@inproceedings{BUT112043,
author="Jan {Martinek} and Radek {Šlesinger} and Petr {Klapetek}",
title="Modeling C-AFM measurement using FEM",
annote="The presented work describes a finite element method based modeling of a conductive AFM measurement process. The C-AFM is a scanning probe microscopy technique for mapping electrical properties of a sample together with its topography. The contact resistance between the probe and the rough surface is modeled in two steps - first the problem of mechanical deformation is solved and then the electrical field, and current, is found. The geometry of the model comes from a real sample topography measured using AFM. The whole multiphysics 3D simulation is done for each data point, which makes the problem possible to be solved only using a supercomputer with many simplifications and optimizations.",
booktitle="Nanocon 2014",
chapter="112043",
howpublished="electronic, physical medium",
year="2014",
month="november",
pages="1--6",
type="conference paper"
}