Detail publikačního výsledku

Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water

MANAKHOV, A.; ZAJÍČKOVÁ, L.; ELIÁŠ, M.; ČECHAL, J.; POLČÁK, J.; HNILICA, J.; BITTNEROVÁ, Š.; NEČAS, D.

Originální název

Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water

Anglický název

Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water

Druh

Článek WoS

Originální abstrakt

The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment.

Anglický abstrakt

The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment.

Klíčová slova

amine coatings;cyclopropylamine;ESCA/XPS;FT-IR;pulsed discharges

Klíčová slova v angličtině

amine coatings;cyclopropylamine;ESCA/XPS;FT-IR;pulsed discharges

Autoři

MANAKHOV, A.; ZAJÍČKOVÁ, L.; ELIÁŠ, M.; ČECHAL, J.; POLČÁK, J.; HNILICA, J.; BITTNEROVÁ, Š.; NEČAS, D.

Vydáno

19.06.2014

ISSN

1612-8850

Periodikum

Plasma Processes and Polymers

Svazek

11

Číslo

6

Stát

Spolková republika Německo

Strany od

532

Strany do

544

Strany počet

13

Plný text v Digitální knihovně

http://hdl.handle.net/

BibTex

@article{BUT107976,
  author="Anton {Manakhov} and Lenka {Zajíčková} and Marek {Eliáš} and Jan {Čechal} and Josef {Polčák} and Jaroslav {Hnilica} and Štěpánka {Bittnerová} and David {Nečas}",
  title="Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water",
  journal="Plasma Processes and Polymers",
  year="2014",
  volume="11",
  number="6",
  pages="532--544",
  doi="10.1002/ppap.201300177",
  issn="1612-8850"
}