Detail publikačního výsledku

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

Originální název

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Anglický název

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Druh

Abstrakt

Originální abstrakt

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Anglický abstrakt

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Klíčová slova

PECVD, fluorocarbon thin films, plasma diagnostics

Klíčová slova v angličtině

PECVD, fluorocarbon thin films, plasma diagnostics

Autoři

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

Rok RIV

2014

Vydáno

28.04.2013

Nakladatel

Eindhoven University

Místo

Eindhoven

Kniha

10th Frontiers in Low Temperature Plasma Diagnostics – Book of Abstracts

Strany od

P1-2

Strany do

P1-2

Strany počet

1