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DALLAEVA, D.
Originální název
Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering
Anglický název
Druh
Stať ve sborníku v databázi WoS či Scopus
Originální abstrakt
Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition.
Anglický abstrakt
Klíčová slova
dry etching, epitaxy, substrate, thin film, scanning probe microscopy
Klíčová slova v angličtině
Autoři
Vydáno
25.04.2013
Nakladatel
Litera, Tabor 43a, 61200 Brno
Místo
Brno University of Technology
ISBN
978-80-214-4695-3
Kniha
Proceedings of the 19th Conference Student EEICT 2013
Edice
první
Strany od
134
Strany do
138
Strany počet
5
BibTex
@inproceedings{BUT99437, author="Dinara {Sobola}", title="Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering", booktitle="Proceedings of the 19th Conference Student EEICT 2013", year="2013", series="první", pages="134--138", publisher="Litera, Tabor 43a, 61200 Brno", address="Brno University of Technology", isbn="978-80-214-4695-3" }