Porous-anodic-alumina-supported nanostructured Ta2O5/Ta films for advanced capacitors

Porous-anodic-alumina-supported nanostructured Ta2O5/Ta films for advanced capacitors

Funkční vzorek

An advanced approach is implemented to fabricate Ta2O5/Ta films with highly porous nanostructured morphology and substantially enlarged surface-to-volume ratio via electrochemical anodizing of tantalum layers sputter-deposited over the nanoporous alumina substrates. Potential application of the films as metal/oxide electrodes for electrolytic and thin-film capacitors

An advanced approach is implemented to fabricate Ta2O5/Ta films with highly porous nanostructured morphology and substantially enlarged surface-to-volume ratio via electrochemical anodizing of tantalum layers sputter-deposited over the nanoporous alumina substrates. Potential application of the films as metal/oxide electrodes for electrolytic and thin-film capacitors

Anodic oxidation of tantalum, Ta2O5 nanostructures, capacitors, porous anodic alumina

Anodic oxidation of tantalum, Ta2O5 nanostructures, capacitors, porous anodic alumina

UMEL, SIX, mist. 0.68

výsledek využívá pouze poskytovatel

Využití výsledku jiným subjektem je možné bez nabytí licence (výsledek není licencován)

http://www.umel.feec.vutbr.cz/LabSensNano/Products.aspx