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Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

ČECH, V.

Originální název

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

Anglický název

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

Druh

Audiovizuální tvorba

Originální abstrakt

A Nano Indenter XP (MTS Systems) was used to perform the indentation tests with a continuous stiffness measurement (CSM) technique and the depth profiles of Young's modulus and hardness to 20% of the film thickness were evaluated. A triangular pyramid (Berkovich) diamond indenter was employed for all experiments. Each sample was subjected to three load-unload cycles.

Anglický abstrakt

A Nano Indenter XP (MTS Systems) was used to perform the indentation tests with a continuous stiffness measurement (CSM) technique and the depth profiles of Young's modulus and hardness to 20% of the film thickness were evaluated. A triangular pyramid (Berkovich) diamond indenter was employed for all experiments. Each sample was subjected to three load-unload cycles.

Klíčová slova

thin film nanoindentation

Klíčová slova v angličtině

thin film nanoindentation

Autoři

ČECH, V.

Vydáno

28.11.2006

Místo

Mittelwihr

Edice

COST P12

URL

http://www.uni-rostock.de/fakult/manafak/physik/poly/COST_P12/index.htm

BibTex

@misc{BUT63473,
  author="Vladimír {Čech}",
  title="Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films",
  year="2006",
  series="COST P12",
  edition="2006",
  address="Mittelwihr",
  url="http://www.uni-rostock.de/fakult/manafak/physik/poly/COST_P12/index.htm",
  note="Audiovisual work"
}