Detail publikačního výsledku

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

VOBORNÝ, S., ZLÁMAL, J., BÁBOR, P.

Originální název

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Anglický název

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Anglický abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Klíčová slova v angličtině

Deposition, Ion source

Autoři

VOBORNÝ, S., ZLÁMAL, J., BÁBOR, P.

Vydáno

19.09.2001

Nakladatel

Fakulta strojního inženýrství VUT v Brně

Místo

Brno

Kniha

Juniormat '01 sborník

Strany od

281

Strany počet

2

BibTex

@inproceedings{BUT3359,
  author="Stanislav {Voborný} and Jakub {Zlámal} and Petr {Bábor}",
  title="Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics",
  booktitle="Juniormat '01 sborník",
  year="2001",
  pages="2",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  address="Brno"
}