Detail publikačního výsledku

Magnetism of Ultrathin TiO2 Films Prepared by Atomic Layer Deposition

RODRIGUEZ PEREIRA, J.; GAZDOVA, K.; PHAM, N.; PIZUROVA, N.; KURKA, M.; PAVLU, J.; NGUYEN, H.; FRIÁK, M.; MACÁK, J.

Originální název

Magnetism of Ultrathin TiO2 Films Prepared by Atomic Layer Deposition

Anglický název

Magnetism of Ultrathin TiO2 Films Prepared by Atomic Layer Deposition

Druh

Článek WoS

Originální abstrakt

The discovery of room-temperature ferromagnetism (FM) in pristine TiO2 films has sparked intense debate regarding its origin, particularly in the absence of conventional magnetic dopants. Herein, for the first time, the FM of ultrathin TiO2 films grown on LaAlO3 (LAO) substrates by Atomic Layer Deposition (ALD) is investigated, yielding TiO2 thicknesses of 1, 5, and 10 nm. The findings reveal a striking thickness-dependent magnetic response, where the 5 nm films exhibit the highest ferromagnetic response, attributed to defect-driven mechanisms. Structural and spectroscopic analyses, complemented by quantum mechanical calculations, highlight the critical role of oxygen vacancies and/or defects, as well as the interface with LAO substrates, in modulating the observed FM. Notably, this work demonstrates that the ferromagnetic behavior is confined to the in-plane direction, reinforcing the role of surface and interface effects. These insights establish that defects play a key role in tuning the electronic and magnetic properties of ultrathin TiO2 films, paving the way for potential applications in next-generation magnetic devices.

Anglický abstrakt

The discovery of room-temperature ferromagnetism (FM) in pristine TiO2 films has sparked intense debate regarding its origin, particularly in the absence of conventional magnetic dopants. Herein, for the first time, the FM of ultrathin TiO2 films grown on LaAlO3 (LAO) substrates by Atomic Layer Deposition (ALD) is investigated, yielding TiO2 thicknesses of 1, 5, and 10 nm. The findings reveal a striking thickness-dependent magnetic response, where the 5 nm films exhibit the highest ferromagnetic response, attributed to defect-driven mechanisms. Structural and spectroscopic analyses, complemented by quantum mechanical calculations, highlight the critical role of oxygen vacancies and/or defects, as well as the interface with LAO substrates, in modulating the observed FM. Notably, this work demonstrates that the ferromagnetic behavior is confined to the in-plane direction, reinforcing the role of surface and interface effects. These insights establish that defects play a key role in tuning the electronic and magnetic properties of ultrathin TiO2 films, paving the way for potential applications in next-generation magnetic devices.

Klíčová slova

TiO2, ultrathin films, Atomic LayerDeposition, ferromagnetism, oxygen vacancies, defects

Klíčová slova v angličtině

TiO2, ultrathin films, Atomic LayerDeposition, ferromagnetism, oxygen vacancies, defects

Autoři

RODRIGUEZ PEREIRA, J.; GAZDOVA, K.; PHAM, N.; PIZUROVA, N.; KURKA, M.; PAVLU, J.; NGUYEN, H.; FRIÁK, M.; MACÁK, J.

Vydáno

17.10.2025

Periodikum

ACS Applied Nano Materials

Svazek

41

Číslo

8

Stát

Spojené státy americké

Strany od

20105

Strany do

20114

Strany počet

10

URL

https://pubs.acs.org/doi/10.1021/acsanm.5c04214

BibTex

@article{BUT199550,
  author="Jhonatan {Rodriguez Pereira} and  {} and  {} and  {} and  {} and  {} and  {} and Martin {Friák} and Jan {Macák}",
  title="Magnetism of Ultrathin TiO2 Films Prepared by Atomic Layer Deposition",
  journal="ACS Applied Nano Materials",
  year="2025",
  volume="41",
  number="8",
  pages="20105--20114",
  doi="10.1021/acsanm.5c04214",
  url="https://pubs.acs.org/doi/10.1021/acsanm.5c04214"
}