Detail publikace

A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering

AVVAL, T. PRŮŠA, S. ČECHAL, J. CUSHMAN, C. V. HODGES, G. T. FEARN, S. KIM, S. H.ČECHAL, J. VANÍČKOVÁ, E. BÁBÍK, P. ŠIKOLA, T. BRONGERSMA, H. H. LINFORD, M. R.

Originální název

A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Surface silanols (SiOH) are important moieties on glass surfaces. Here we present a tag-and-count approach for determining surface silanol densities, which consists of tagging surface silanols with Zn via atomic layer depo-sition (ALD) followed by detection of the zinc by high sensitivity-low energy ion scattering (HS-LEIS). Shards of fused silica were hydroxylated with aqueous hydrofluoric acid (HF) and then heated to 200, 500, 700, or 900 degrees C. These heat treatments increasingly condense and remove surface silanols. The samples then underwent one ALD cycle with dimethylzinc (DMZ) or diethylzinc (DEZ) followed by water. As expected, fused silica surfaces heated to higher temperatures showed lower Zn coverages. When fused silica surfaces treated at 200 degrees C were exposed to DMZ for two different dose times, the same sub-monolayer quantity of Zn was obtained by X-ray photoelectron spectroscopy (XPS). Surface cleaning/preparation immediately before HS-LEIS, including atomic oxygen treat-ment and annealing, played a critical role in these efforts. Surfaces treated with DMZ generally showed slightly higher Zn signals by LEIS. Using this methodology, a value of 4.59 OH/nm2 was found for fully hydroxylated fused silica. Both this result and those obtained at 500, 700, and 900 degrees C are in very good agreement with literature values.

Klíčová slova

Fused silica; Silanol; LEIS; ALD; XPS; Tag-and-count

Autoři

AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R.

Vydáno

1. 1. 2023

Nakladatel

ELSEVIER

Místo

AMSTERDAM

ISSN

0169-4332

Periodikum

Applied Surface Science

Ročník

607

Číslo

154551

Stát

Nizozemsko

Strany od

154551

Strany do

154559

Strany počet

9

URL

https://www.sciencedirect.com/science/article/pii/S0169433222020839

BibTex

@article{BUT182842,
  author="AVVAL, T. and PRŮŠA, S. and ČECHAL, J. and CUSHMAN, C. V. and HODGES, G. T. and FEARN, S. and KIM, S. H. and ČECHAL, J. and VANÍČKOVÁ, E. and BÁBÍK, P. and ŠIKOLA, T. and BRONGERSMA, H. H. and LINFORD, M. R.",
  title="A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering",
  journal="Applied Surface Science",
  year="2023",
  volume="607",
  number="154551",
  pages="9",
  doi="10.1016/j.apsusc.2022.154551",
  issn="0169-4332",
  url="https://www.sciencedirect.com/science/article/pii/S0169433222020839"
}