Detail publikace

Growth of In2O3(111) thin films with optimized surfaces

FRANCESCHI, G. WAGNER, M. HOFINGER, J. KRAJŇÁK, T. SCHMID, M. DIEBOLD, U. RIVA, M.

Originální název

Growth of In2O3(111) thin films with optimized surfaces

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Indium oxide is widely employed in applications ranging from optoelectronics and gas sensing to catalysis, as well as in thin-film heterostructures. To probe the fundamentals of phenomena at the heart of In2O3-based devices that are tied to the intrinsic surface and interface properties of the material, well-defined single-crystalline In2O3 surfaces are needed. We report on how to grow atomically flat In2O3(111) thin films on yttria-stabilized zirconia substrates by pulsed laser deposition. The films are largely relaxed and reproduce the atomic-scale details of the surfaces of single crystals, except for line defects originating from the antiphase domain boundaries that form because of the one-on-four lattice match between the surface unit cells of In2O3(111) and of the substrate. While optimizing the growth conditions, we observe that the morphology of the films is ruled by the oxygen chemical potential, which determines the nature and diffusivity of adspecies during growth.

Klíčová slova

OXIDE; MORPHOLOGY; MOBILITY

Autoři

FRANCESCHI, G.; WAGNER, M.; HOFINGER, J.; KRAJŇÁK, T.; SCHMID, M.; DIEBOLD, U.; RIVA, M.

Vydáno

10. 10. 2019

ISSN

2475-9953

Periodikum

PHYSICAL REVIEW MATERIALS

Ročník

3

Číslo

10

Stát

Spojené státy americké

Strany od

103403

Strany do

103403

Strany počet

10

URL

https://journals.aps.org/prmaterials/abstract/10.1103/PhysRevMaterials.3.103403

BibTex

@article{BUT159387,
  author="Giada {Franceschi} and Margareta {Wagner} and Jakob {Hofinger} and Tomáš {Krajňák} and Michael {Schmid} and Ulrike {Diebold} and Michele {Riva}",
  title="Growth of In2O3(111) thin films with optimized surfaces",
  journal="PHYSICAL REVIEW MATERIALS",
  year="2019",
  volume="3",
  number="10",
  pages="103403--103403",
  doi="10.1103/PhysRevMaterials.3.103403",
  issn="2475-9953",
  url="https://journals.aps.org/prmaterials/abstract/10.1103/PhysRevMaterials.3.103403"
}