Detail publikace

The growth and dielectric properties of anodic films on porous-alumina-supported Ta-50wt.%Nb alloy layers

MOZALEV, A. SOLOVEI, D. HUBALEK, J. HABAZAKI, H.

Originální název

The growth and dielectric properties of anodic films on porous-alumina-supported Ta-50wt.%Nb alloy layers

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

Anodic mixed-oxide films are prepared on Ta-50wt.%Nb alloy layers magnetron sputtered over nanoporous anodic alumina substrates and examined as an alternative dielectric for electrolytic and integral capacitors. The dielectric and electrical phenomena revealed in the films are discussed in relation to their nano-morphology, crystalline structure and chemical composition.

Klíčová slova

Ta-Nb mixed oxide, anodizing, porous alumina, nanostructures, dielectric properties

Autoři

MOZALEV, A.; SOLOVEI, D.; HUBALEK, J.; HABAZAKI, H.

Vydáno

14. 8. 2012

Nakladatel

ISE

Místo

Linz, Austria

Strany od

1

Strany do

1

Strany počet

1

BibTex

@misc{BUT96861,
  author="Alexander {Mozalev} and Dmitry {Solovei} and Jaromír {Hubálek} and Hiroki {Habazaki}",
  title="The growth and dielectric properties of anodic films on porous-alumina-supported Ta-50wt.%Nb alloy layers",
  booktitle="9th International Symposium on Electrochemical Micro & Nanosystem Technology",
  year="2012",
  pages="1",
  publisher="ISE",
  address="Linz, Austria",
  note="abstract"
}