Detail publikačního výsledku

Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography

HORÁK, M.; BUKVIŠOVÁ, K.; ŠVARC, V.; JASKOWIEC, J.; KŘÁPEK, V.; ŠIKOLA, T.

Originální název

Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography

Anglický název

Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography

Druh

Článek WoS

Originální abstrakt

We present a comparative study of plasmonic antennas fabricated by electron beam lithography and direct focused ion beam milling. We have investigated optical and structural properties and chemical composition of gold disc-shaped plasmonic antennas on a silicon nitride membrane fabricated by both methods to identify their advantages and disadvantages. Plasmonic antennas were characterized using transmission electron microscopy including electron energy loss spectroscopy and energy dispersive X-ray spectroscopy, and atomic force microscopy. We have found stronger plasmonic response with better field confinement in the antennas fabricated by electron beam lithography, which is attributed to their better structural quality, homogeneous thickness, and only moderate contamination mostly of organic nature. Plasmonic antennas fabricated by focused ion beam lithography feature weaker plasmonic response, lower structural quality with pronounced thickness fluctuations, and strong contamination, both organic and inorganic, including implanted ions from the focused beam. While both techniques are suitable for the fabrication of plasmonic antennas, electron beam lithography shall be prioritized over focused ion beam lithography due to better quality and performance of its products.

Anglický abstrakt

We present a comparative study of plasmonic antennas fabricated by electron beam lithography and direct focused ion beam milling. We have investigated optical and structural properties and chemical composition of gold disc-shaped plasmonic antennas on a silicon nitride membrane fabricated by both methods to identify their advantages and disadvantages. Plasmonic antennas were characterized using transmission electron microscopy including electron energy loss spectroscopy and energy dispersive X-ray spectroscopy, and atomic force microscopy. We have found stronger plasmonic response with better field confinement in the antennas fabricated by electron beam lithography, which is attributed to their better structural quality, homogeneous thickness, and only moderate contamination mostly of organic nature. Plasmonic antennas fabricated by focused ion beam lithography feature weaker plasmonic response, lower structural quality with pronounced thickness fluctuations, and strong contamination, both organic and inorganic, including implanted ions from the focused beam. While both techniques are suitable for the fabrication of plasmonic antennas, electron beam lithography shall be prioritized over focused ion beam lithography due to better quality and performance of its products.

Klíčová slova

Plasmonic antennas; electron beam lithography; focused ion beam lithography; electron energy loss spectroscopy; localized surface plasmon.

Klíčová slova v angličtině

Plasmonic antennas; electron beam lithography; focused ion beam lithography; electron energy loss spectroscopy; localized surface plasmon.

Autoři

HORÁK, M.; BUKVIŠOVÁ, K.; ŠVARC, V.; JASKOWIEC, J.; KŘÁPEK, V.; ŠIKOLA, T.

Rok RIV

2019

Vydáno

25.06.2018

Nakladatel

Springer Nature

ISSN

2045-2322

Periodikum

Scientific Reports

Svazek

8

Číslo

1

Stát

Spojené království Velké Británie a Severního Irska

Strany od

9640

Strany do

9648

Strany počet

8

URL

http://link.springer.com/article/10.1038/s41598-018-28037-1

Plný text v Digitální knihovně

http://hdl.handle.net/11012/83813

BibTex

@article{BUT148493,
  author="Michal {Horák} and Kristýna {Bukvišová} and Vojtěch {Švarc} and Jiří {Jaskowiec} and Vlastimil {Křápek} and Tomáš {Šikola}",
  title="Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography",
  journal="Scientific Reports",
  year="2018",
  volume="8",
  number="1",
  pages="9640--9648",
  doi="10.1038/s41598-018-28037-1",
  issn="2045-2322",
  url="http://link.springer.com/article/10.1038/s41598-018-28037-1"
}

Dokumenty

Horák - SciReps - Comparative study of plasmonic antennas fabricated by EBL and FIB