Detail publikačního výsledku

FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources

STEVIE, F.; SEDLÁČEK, L.; BÁBOR, P.; JIRUŠE, J.; PRINCIPE, E.; KLOSOVÁ, K.

Originální název

FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources

Anglický název

FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources

Druh

Článek WoS

Originální abstrakt

A novel time of flight SIMS analyzer provides a new approach to SIMS analysis as an addition to a focused ion beam SEM instrument. The combination of this analyzer with a high current plasma ion source offers new opportunities for analysis, particularly in the study of coatings, which require ultra-deep profiling. Use of this instrumentation showed the ability to detect and quantify a number of elements. Quantification was obtained for Li, Na, K ion implanted in Si and for B in a sample with known concentration. Use of the electron beam from the electron column permitted analysis of 300-nm SiO2/Si implanted with BF2.

Anglický abstrakt

A novel time of flight SIMS analyzer provides a new approach to SIMS analysis as an addition to a focused ion beam SEM instrument. The combination of this analyzer with a high current plasma ion source offers new opportunities for analysis, particularly in the study of coatings, which require ultra-deep profiling. Use of this instrumentation showed the ability to detect and quantify a number of elements. Quantification was obtained for Li, Na, K ion implanted in Si and for B in a sample with known concentration. Use of the electron beam from the electron column permitted analysis of 300-nm SiO2/Si implanted with BF2.

Klíčová slova

SIMS depth profiling; plasma ion source; TOF-SIMS analyzer; FIB-SIMS; SIMS quantification; high sputtering rate

Klíčová slova v angličtině

SIMS depth profiling; plasma ion source; TOF-SIMS analyzer; FIB-SIMS; SIMS quantification; high sputtering rate

Autoři

STEVIE, F.; SEDLÁČEK, L.; BÁBOR, P.; JIRUŠE, J.; PRINCIPE, E.; KLOSOVÁ, K.

Rok RIV

2016

Vydáno

24.11.2014

ISSN

0142-2421

Periodikum

SURFACE AND INTERFACE ANALYSIS

Svazek

46

Číslo

S1

Stát

Spojené království Velké Británie a Severního Irska

Strany od

285

Strany do

287

Strany počet

3

BibTex

@article{BUT110788,
  author="F. A. {Stevie} and L. {Sedláček} and Petr {Bábor} and Jaroslav {Jiruše} and E. {Principe} and K. {Klosová}",
  title="FIB-SIMS quantification using TOF-SIMS with Ar and Xe plasma sources",
  journal="SURFACE AND INTERFACE ANALYSIS",
  year="2014",
  volume="46",
  number="S1",
  pages="285--287",
  doi="10.1002/sia.5483",
  issn="0142-2421"
}