Vyvinutí nových metod návrhu systémů tenkých vrstev vyráběných v optickém průmyslu zahrnujících defekty vrstev a originálních metod charakterizace těchto systémů umožňujících zdokonalení kontroly kvality. Technologické změny depozice vrstevnatých systémů vyráběných v optickém průmyslu, jako jsou zrcadla s vysokou odrazivostí, antireflexní pokrytí, děliče světla a polarizátory, minimalizující jejich nedokonalosti především v ultrafialové oblasti spektra a umožňující nové progresivní aplikace.

Description in English
Development of new methods of design of thin film systems produced in the optics industry including film defects and original methods of characterization of these systems that will allow improving their quality. Technological changes of deposition of multilayer systems such as mirrors with high reflectance, anti-reflective coatings, beam splitters and polarizers, minimizing their imperfections namely in the ultraviolet part of the spectrum and enabling new progressive applications.

Keywords
tenké vrstvy, defekty vrstev

Key words in English
characterization of single SiO2, HfO2, Al2O3, TiO2, MgF2 layers- including thin film defects in characterization- design of thin film systems- vacuum evaporation from thermal and electron sources- cathodic sputtering

TA02010784

Czech

Ohlídal Ivan, prof. RNDr., DrSc. - principal person responsible
Ohlídal Miloslav, prof. RNDr., CSc. - fellow researcher

Institute of Physical Engineering
- responsible department (1.1.1989 - not assigned)
Institute of Physical Engineering
- co-beneficiary (1.1.2012 - 31.12.2015)

NÁDASKÝ, P.; OHLÍDAL, M.: Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V. Jena (07.09.2015)
Detail

NEČAS, D.; OHLÍDAL, I.; FRANTA, D.; ČUDEK, V.; OHLÍDAL, M.; VODÁK, J. Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films. APPLIED OPTICS, 2014, vol. 53, no. 25, p. 5606-5614. ISSN: 1559-128X.
Detail

NEČAS, D.; ČUDEK, V.; VODÁK, J.; OHLÍDAL, M.; KLAPETEK, P.; ZAJÍČKOVÁ, L. Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry. MEASUREMENT SCIENCE and TECHNOLOGY, 2014, vol. 25, no. 11, p. 1-9. ISSN: 0957-0233.
Detail

NEČAS, D.; OHLÍDAL, I.; VODÁK, J.; OHLÍDAL, M.; FRANTA, D. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry. In Optical Systems Design 2015: Advances in Optical Thin Films V. Proceedings of SPIE. 2015. no. 9628, p. 0C-1 (0C-9 p.)ISBN: 9781628418170. ISSN: 0277-786X.
Detail

NEČAS, D.; OHLÍDAL, I.; FRANTA, D.; ČUDEK, V.; OHLÍDAL, M.; VODÁK, J.; SLÁDKOVÁ, L.; ZAJÍČKOVÁ, L.; ELIÁŠ, M.; VIŽĎA, F. Assessment of non_uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry. Thin Solid Films, 2014, vol. 571, no. 3, p. 573-578. ISSN: 0040-6090.
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NÁDASKÝ, P.; ŠUSTEK, Š.; KLUS, J.; OHLÍDAL, M.; VODÁK, J. Scattermeter for measurements of solar cells. In Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V. Proceedings of SPIE. 2015. no. 9628, p. 96280-96288. ISBN: 9781628418170. ISSN: 0277-786X.
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OHLÍDAL, M.; OHLÍDAL, I.; NEČAS, D.; VODÁK, J.; FRANTA, D.; NÁDASKÝ, P.; VIŽĎA, F. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V. Proceedings of SPIE. 2015. no. 9628, p. 0R-1 (0R-13 p.)ISBN: 9781628418170. ISSN: 0277-786X.
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VODÁK, J.; OHLÍDAL, M. Zobrazovací spektroskopický reflektometr založený na membránovém děliči. Jemná mechanika a optika, 2016, roč. 61, č. 6, s. 144-148. ISSN: 0447-6441.
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VODÁK, J.; NEČAS, D.; PAVLIŇÁK, D.; MACÁK, J.; ŘIČICA, T.; JAMBOR, R.; OHLÍDAL, M. Application of imaging spectroscopic reflectometry for characterization of gold reduction from organometallic compound by means of plasma jet technology. APPLIED SURFACE SCIENCE, 2017, no. 396, p. 284-290. ISSN: 0169-4332.
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VODÁK, J.; NEČAS, D.; OHLÍDAL, M.; OHLÍDAL, I. Determination of local thickness values of non-uniform thin films by imaging spectroscopic reflectometer with enhanced spatial resolution. MEASUREMENT SCIENCE and TECHNOLOGY, 2017, vol. 28, no. 2, p. 025205 (025205-6 p.)ISSN: 0957-0233.
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SCHÄFER, J.; HNILICA, J.; ŠPERKA, J.; QUADE, A.; KUDRLE, V.; FOEST, R.; VODÁK, J.; ZAJÍČKOVÁ, L. Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure. SURFACE & COATINGS TECHNOLOGY, 2016, no. 295, p. 112-118. ISSN: 0257-8972.
Detail

NEČAS, D.; OHLÍDAL, I.; FRANTA, D.; OHLÍDAL, M.; VODÁK, J. Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry. Journal of Optics, 2016, vol. 18, no. 1, p. 2-11. ISSN: 2040-8978.
Detail

Responsibility: Ohlídal Ivan, prof. RNDr., DrSc.