Publication result detail

Assessment of non_uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

NEČAS, D.; OHLÍDAL, I.; FRANTA, D.; ČUDEK, V.; OHLÍDAL, M.; VODÁK, J.; SLÁDKOVÁ, L.; ZAJÍČKOVÁ, L.; ELIÁŠ, M.; VIŽĎA, F.

Original Title

Assessment of non_uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

English Title

Assessment of non_uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

Type

WoS Article

Original Abstract

Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed.

English abstract

Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed.

Keywords

Variable-angle spectroscopic ellipsometry, Mapping spectroscopic ellipsometry, Imaging spectroscopic reflectometry, Non-uniform thin films

Key words in English

Variable-angle spectroscopic ellipsometry, Mapping spectroscopic ellipsometry, Imaging spectroscopic reflectometry, Non-uniform thin films

Authors

NEČAS, D.; OHLÍDAL, I.; FRANTA, D.; ČUDEK, V.; OHLÍDAL, M.; VODÁK, J.; SLÁDKOVÁ, L.; ZAJÍČKOVÁ, L.; ELIÁŠ, M.; VIŽĎA, F.

RIV year

2015

Released

28.11.2014

Publisher

Elsevier B.V.

ISBN

0040-6090

Periodical

Thin Solid Films

Volume

571

Number

3

State

Kingdom of the Netherlands

Pages from

573

Pages to

578

Pages count

6

BibTex

@article{BUT109003,
  author="David {Nečas} and Ivan {Ohlídal} and Daniel {Franta} and Vladimír {Čudek} and Miloslav {Ohlídal} and Jiří {Vodák} and Lucia {Sládková} and Lenka {Zajíčková} and Marek {Eliáš} and František {Vižďa}",
  title="Assessment of non_uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry",
  journal="Thin Solid Films",
  year="2014",
  volume="571",
  number="3",
  pages="573--578",
  doi="10.1016/j.tsf.2013.12.036",
  issn="0040-6090"
}