Publication result detail

Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry

NEČAS, D.; ČUDEK, V.; VODÁK, J.; OHLÍDAL, M.; KLAPETEK, P.; ZAJÍČKOVÁ, L.

Original Title

Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry

English Title

Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry

Type

WoS Article

Original Abstract

The construction of a normal-incidence imaging spectrophotometer for mapping of thin film properties is described. It is based on an on-axis reflective imaging system, utilising a telescope-like arrangement. A charge-coupled device camera is used as the detector, permitting measurements in the spectral range of 275-1100 nm with resolution of 37 square micrometers. The performance of the instrument is demonstrated by optical characterisation of highly non-uniform thin films deposited from hexamethyldisiloxane on silicon substrates by a single capillary plasma jet at atmospheric pressure. The imaging spectrophotometry is used as a self-sufficient technique for the determination of both the film optical constants and maps of local thickness. The thickness maps are compared with the results of conventional thickness profile characterisation methods, profilometry and atomic force microscopy and the differences and errors are discussed.

English abstract

The construction of a normal-incidence imaging spectrophotometer for mapping of thin film properties is described. It is based on an on-axis reflective imaging system, utilising a telescope-like arrangement. A charge-coupled device camera is used as the detector, permitting measurements in the spectral range of 275-1100 nm with resolution of 37 square micrometers. The performance of the instrument is demonstrated by optical characterisation of highly non-uniform thin films deposited from hexamethyldisiloxane on silicon substrates by a single capillary plasma jet at atmospheric pressure. The imaging spectrophotometry is used as a self-sufficient technique for the determination of both the film optical constants and maps of local thickness. The thickness maps are compared with the results of conventional thickness profile characterisation methods, profilometry and atomic force microscopy and the differences and errors are discussed.

Keywords

imaging spectrophotometry; micro-plasma jet; non-uniform thin films; optical properties; thickness mapping

Key words in English

imaging spectrophotometry; micro-plasma jet; non-uniform thin films; optical properties; thickness mapping

Authors

NEČAS, D.; ČUDEK, V.; VODÁK, J.; OHLÍDAL, M.; KLAPETEK, P.; ZAJÍČKOVÁ, L.

RIV year

2015

Released

13.10.2014

Publisher

IOP PUBLISHING LTD

Location

TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND

ISBN

0957-0233

Periodical

MEASUREMENT SCIENCE and TECHNOLOGY

Volume

25

Number

11

State

United Kingdom of Great Britain and Northern Ireland

Pages from

1

Pages to

9

Pages count

9

BibTex

@article{BUT109014,
  author="David {Nečas} and Vladimír {Čudek} and Jiří {Vodák} and Miloslav {Ohlídal} and Petr {Klapetek} and Lenka {Zajíčková}",
  title="Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry",
  journal="MEASUREMENT SCIENCE and TECHNOLOGY",
  year="2014",
  volume="25",
  number="11",
  pages="1--9",
  doi="10.1088/0957-0233/25/11/115201",
  issn="0957-0233"
}