Přístupnostní navigace
E-application
Search Search Close
Bachelor's Thesis
Author of thesis: Ing. Adam Závodný
Acad. year: 2013/2014
Supervisor: prof. Ing. Jan Čechal, Ph.D.
Reviewer: prof. Ing. Miroslav Kolíbal, Ph.D.
This bachelor's thesis deals with preparation and analysis of cobalt thin films and determination of the thermal stability of Al2O3/Au/SiO2/Si multilayer. The films are formed on the crystalline silicon with oxide surface layer, i.e. SiO2/Si(111) and Al2O3/SiO2/Si(111). Thin films are prepared using an effusion cell and their growth is studied as a function of substrate temperature, type and layer thickness. Prepared samples are studied by the X-ray Photoelectron Spectroscopy, Scanning Electron Microscopy and Atomic Force Microscopy.
cobalt, silicon, silicon dioxide, aluminium oxide, thin film growth, MBE, XPS, SEM, AFM
Date of defence
25.06.2014
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (B3901-3)
Field of study
Physical Engineering and Nanotechnology (B-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportprof. Ing. Jan Čechal, Ph.D.
Grade proposed by supervisor: A
Reviewer’s reportprof. Ing. Miroslav Kolíbal, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová