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Bachelor's Thesis
Author of thesis: Ing. Tomáš Musálek
Acad. year: 2013/2014
Supervisor: prof. Ing. Miroslav Kolíbal, Ph.D.
Reviewer: Ing. Mgr. Tomáš Šamořil, Ph.D.
This bachelor's thesis deals with wet anisotropic etching of silicon and germanium. Two different approaches to the formation of anisotropic etch pits are shown. The supporting activities required for etching procedure are described. Especially, preparation of mask by electron beam litography, etching of SiO2 resp. GeO2 and application of metal particles.
Silicon, germanium, anisotropic etching, electron beam litography, metal nanoparticles.
Date of defence
25.06.2014
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (B3901-3)
Field of study
Physical Engineering and Nanotechnology (B-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportprof. Ing. Miroslav Kolíbal, Ph.D.
Grade proposed by supervisor: A
Reviewer’s reportIng. Mgr. Tomáš Šamořil, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová