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Bachelor's Thesis
Author of thesis: Ing. Marek Šikula
Acad. year: 2012/2013
Supervisor: doc. Ing. Jindřich Mach, Ph.D.
Reviewer: doc. Ing. Petr Bábor, Ph.D.
Ultrathin oxid layers (especially high-k layers) are studied and fabricated by using atomic oxygen sources. These high-k ultrathin layers are integrated into CMOS transistors and DRAM capacitors. In this thesis theory of atomic oxygen beams and ways of theirs creation is summarized. On the basis of the obtained knowledge the engineering design of a unique type of the thermal atomic oxygen source is created. The design was tested by simple experiments. The 3D model and complete engineering drawings are included.
Thermal dissociation, thermal source, ionic conductivity, atomic oxygen, thermal beams of oxygen atoms, ZrO2 caramics
Date of defence
19.06.2013
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (B3901-3)
Field of study
Physical Engineering and Nanotechnology (B-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportdoc. Ing. Jindřich Mach, Ph.D.
Grade proposed by supervisor: A
Reviewer’s reportdoc. Ing. Petr Bábor, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová