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Bachelor's Thesis
Author of thesis: Ing. Jana Flajšmanová, Ph.D.
Acad. year: 2012/2013
Supervisor: doc. Ing. Jindřich Mach, Ph.D.
Reviewer: Ing. Stanislav Voborný, Ph.D.
This bachelor's thesis deals with the selective growth of gallium (Ga) and gallium nitride (GaN). In theoretical part, there is a brief description of growth of ultrathin films with respect to GaN and their manufacturing. Experimental part is aimed to the deposition of Ga and GaN on silicon substrates Si(1 1 1). Substrates with the native silicon dioxide layer (SiO2) were modified by focused ion beam (FIB). GaN was deposited by pulsed deposition followed by postnitridation. Prepared samples were studied by atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM).
Ga, GaN, selective growth, pulse deposition, postnitridation, FIB, ion-atomic source, effusion cell, XPS.
Date of defence
19.06.2013
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (B3901-3)
Field of study
Physical Engineering and Nanotechnology (B-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportdoc. Ing. Jindřich Mach, Ph.D.
Grade proposed by supervisor: A
Reviewer’s reportIng. Stanislav Voborný, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová