Přístupnostní navigace
E-application
Search Search Close
Bachelor's Thesis
Author of thesis: Ing. Martin Dvořák
Acad. year: 2010/2011
Supervisor: doc. Ing. Jindřich Mach, Ph.D.
Reviewer: Ing. Stanislav Voborný, Ph.D.
This bachelor´s thesis deals with design, testing and calibration of an effussion cell generating silicon atomic beam having thermal energy (0,1 - 1 eV). These beams are used for the preparation of Si and SiN ultrathin films. Silicon nitride and its applications in semiconductor industry are reviewed. First experiments with deposition of ultrathin films of Si and SiN are described. These layers have been analyzed by x-ray photoelectron spektroscopy (XPS) and atomic force microscopy (AFM).
SiN, growth ultra thin layers, effusion cell, UHV,MBE
Date of defence
21.06.2011
Result of the defence
Defended (thesis was successfully defended)
Grading
B
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (B3901-3)
Field of study
Physical Engineering and Nanotechnology (B-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) doc. RNDr. Josef Kuběna, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportdoc. Ing. Jindřich Mach, Ph.D.
Grade proposed by supervisor: B
Reviewer’s reportIng. Stanislav Voborný, Ph.D.
Grade proposed by reviewer: B
Responsibility: Mgr. et Mgr. Hana Odstrčilová