Přístupnostní navigace
E-application
Search Search Close
Publication result detail
PRŮŠA, S.; KOLÍBAL, M.; BÁBOR, P.; MACH, J.; ŠIKOLA, T.
Original Title
Analysis of thin films by TOF-LEIS
English Title
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
In the paper the design and application of a TOF-LEIS instrument built into an UHV complex deposition and analytical apparatus is described. A special attention is aimed at demonstrating the ability of TOF-LEIS to analyse near-to-surface layers of thin films prepared both ex-situ and in-situ. Additionally, the monitoring of diffusion processes close to a sample surface by this technique is presented. It is shown that the broadening of peaks in TOF-LEIS spectra can be attributed to multiple scattering and inelastic losses of ions in deeper layers. As a result of that, the peak width of ultrathin films depends on their thickness.
English abstract
Keywords
Time of Flight, TOF, Low energy, Ion Scattering, LEIS, Surfaces
Key words in English
Authors
Released
01.05.2007
ISBN
0587-4246
Periodical
ACTA PHYSICA POLONICA A
Volume
111
Number
3
State
Republic of Poland
Pages from
335
Pages to
341
Pages count
7
BibTex
@article{BUT43454, author="Stanislav {Průša} and Miroslav {Kolíbal} and Petr {Bábor} and Jindřich {Mach} and Tomáš {Šikola}", title="Analysis of thin films by TOF-LEIS", journal="ACTA PHYSICA POLONICA A", year="2007", volume="111", number="3", pages="335--341", issn="0587-4246" }