This project is co-financed with state support of the CR Technological Agency as part of 2. veřejná soutěž: Program Národní centra kompetence
www.tacr.cz
Research useful for society.

Project detail

Lithography Techniques

Duration: 1.4.2023 — 31.12.2028

Funding resources

Technologická agentura ČR - 2. veřejná soutěž: Program Národní centra kompetence

On the project

The motivation of this sub–project is the development of technology processes and design rules for specific optical elements in VIS/UV regions, metasurfaces and particle traps.

Keywords
Lithography Techniques

Mark

TN02000020/020

Default language

English

People responsible

Ligmajer Filip, Ing., Ph.D. - principal person responsible

Units

Fabrication and Characteris. of Nanostr.
- responsible department (16.3.2023 - not assigned)
Fabrication and Characteris. of Nanostr.
- beneficiary (16.3.2023 - not assigned)

Results

ČERVINKA, O.; LIGMAJER, F.; HRTOŇ, M.; VENOS, Š.; LELEK, J.; ULEHLA, L.: Metapovrchová struktura umožňující polarizačně rozlišenou analýzu pokřivení optické vlnoplochy. (Funkční vzorek)
Detail

Responsibility: Ligmajer Filip, Ing., Ph.D.