In this thesis we briefly outline the properties and utilization of metal phthalocyanines, the
procedure of iron phthalocyanine thin film deposition on Si(100), the supplementary post-deposition
analysis by XPS and the equipment used to measure X-ray reflectivity. Further
we describe the theoretical description of physical background of X-ray diffraction on a
crystal, the measurement of X-ray reflectivity and evaluation of acquired data, focusing
on determination of the thin film thickness, identification of its crystal structure and lattice
parameters. It has been found out that iron phthalocyanine thin films deposited on a
substrate at room temperature grow as an alpha-phase in the shape of needles perpendicular
to substrate surface, so the film thickness, due to high rougness of the film, can be only
estimated with the help of Scherrer equation for long depositions. In the case of shorter
depositions (and thus lower roughness) the Kiessig fringes method can be used. By the
post-deposition annealing we were not able to induce a phase transition; at required
temperatures all the material on the substrate evaporated. By a deposition on a substrate
heated to 160°C we acquired considerably rough film with unclear crystalline phase.