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Master's Thesis
Author of thesis: Ing. Ondřej Metelka
Acad. year: 2013/2014
Supervisor: Ing. Mgr. Tomáš Šamořil, Ph.D.
Reviewer: doc. RNDr. Petr Mikulík, Ph.D.
The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut.
Silicon, electron beam litography, EBL, scanning electron microscope, SEM, etching mask, anisotropic wet etching, potassium hydroxide, KOH, FTIR, surface plasmon polariton, effective refractive index
Date of defence
24.06.2014
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Language of thesis
Czech
Faculty
Fakulta strojního inženýrství
Department
Institute of Physical Engineering
Study programme
Applied Sciences in Engineering (N3901-2)
Field of study
Physical Engineering and Nanotechnology (M-FIN)
Composition of Committee
prof. RNDr. Tomáš Šikola, CSc. (předseda) prof. RNDr. Miroslav Liška, DrSc. (místopředseda) prof. RNDr. Bohumila Lencová, CSc. (člen) prof. RNDr. Jiří Komrska, CSc. (člen) prof. RNDr. Petr Dub, CSc. (člen) prof. RNDr. Radim Chmelík, Ph.D. (člen) prof. RNDr. Jiří Spousta, Ph.D. (člen) prof. Ing. Ivan Křupka, Ph.D. (člen) prof. RNDr. Pavel Zemánek, Ph.D. (člen) RNDr. Antonín Fejfar, CSc. (člen)
Supervisor’s reportIng. Mgr. Tomáš Šamořil, Ph.D.
Grade proposed by supervisor: A
Reviewer’s reportdoc. RNDr. Petr Mikulík, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová