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Bachelor's Thesis
Author of thesis: Tomáš Svoboda
Acad. year: 2025/2026
Supervisor: Ing. Edita Hejátková
Reviewer: doc. Ing. Martin Adámek, Ph.D.
This bachelor’s thesis focuses on the process simulation and electrical device simulation and their calibration using structures fabricated on silicon carbide (SiC) wafers. The simulations were performed using the Synopsys TCAD tool suite. The work is divided into two experiments, preceded by a theoretical background. The first experiment focuses on the simulation of ion implantation using the Sentaurus Process tool, where calibration was performed by adjusting empirical parameters based on profiles obtained from secondary ion mass spectrometry (SIMS). Two calibration approaches were compared, resulting in a significant improvement in simulation accuracy, particularly in the region of lower implantation energies. The second experiment deals with the simulation of electrical parameters of Transmission Line Method (TLM) structures using Sentaurus Device. The sheet resistance was calibrated based on a comparison with experimental measurements. Custom automation tools were developed to accelerate data processing. Improved accuracy was achieved for selected structures; however, the simulation models revealed inherent limitations. Adjustments of mobility models for SiC appear to be a promising direction for further improvement.
silicon carbide (SiC), Secondary Ion Mass Spectrometry (SIMS), Transmission Line Method (TLM), Synopsys TCAD, Sentaurus Process, Sentaurus Device, incomplete ionization, sheet resistance, calibration
Date of defence
17.06.2026
Result of the defence
Defended (thesis was successfully defended)
Grading
A
Process of defence
Student seznámil státní zkušební komisi s řešením své bakalářské práce a zodpověděl otázky a připomínky oponenta. Dále odpověděl na otázky komise: Komise se dotázala na shodu simulovaných výsledků s měřenými výsledky. Student konzultoval s komisí výsledky v tabulce v jeho prezentaci. Komise se dále zeptala na důvod zamlžení některých informací v prezentaci, což student vysvětlil firemním tajemstvím firmy onsemi. Komise se zeptala na řetězec simulace a kde jsou omezení simulace. Student odpověděl že přesnost simulace je výrazně ovlivněna přesností vstupních dat.
Language of thesis
English
Faculty
Fakulta elektrotechniky a komunikačních technologií
Department
Department of Microelectronics
Study programme
Microelectronics and Technology (BPC-MET)
Composition of Committee
prof. Ing. Radimír Vrba, CSc. (předseda) doc. Ing. Vilém Kledrowetz, Ph.D. (místopředseda) doc. Ing. Imrich Gablech, Ph.D. (člen) Ing. Jitka Brüstlová, CSc. (člen) Ing. Dušan Zošiak (člen)
Supervisor’s reportIng. Edita Hejátková
Grade proposed by supervisor: A
Reviewer’s reportdoc. Ing. Martin Adámek, Ph.D.
Grade proposed by reviewer: A
Responsibility: Mgr. et Mgr. Hana Odstrčilová