Advanced analysis of electron optical systems using the EOD software.

• Expansion of the multipole potential, aberration polynomial, influence of aberrations on the wavefront, and probe. Diffraction integral.

• Optimization of magnetic lens geometry, reduction of spherical and chromatic aberrations.

• Multi-configuration – optimization of a lens operating in multiple imaging modes.

• Dynamic corrections of the deflection system – coma, astigmatism, field curvature, and distortion.

• Dynamic corrections of the deflection system.

• Focusing effects of a strong dipole field – Wien filter.

• Quadrupole and octupole fields – correction of spherical and chromatic aberration.

• Quadrupole and octupole corrector for spherical and chromatic aberration.

• Quadrupole and octupole corrector for spherical and chromatic aberration.

• Determination of aberrations of an imaging system by ray tracing – electron mirror.

• Electron mirror.

• Electron collision ion source.

• Presentation of the individual project.