Publication result detail

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

ČECH, V.

Original Title

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

English Title

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

Type

Paper in proceedings (conference paper)

Original Abstract

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

English abstract

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Keywords

thin films, PECVD, fiber-reinforced composites

Key words in English

thin films, PECVD, fiber-reinforced composites

Authors

ČECH, V.

Released

17.12.2012

Book

Proceedings 7th Asia-Pacific Int. Symp. Basics Appl. Plasma Technology (APSPT-7)

Pages from

1

Pages to

4

Pages count

4

BibTex

@inproceedings{BUT97134,
  author="Vladimír {Čech}",
  title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys",
  booktitle="Proceedings 7th Asia-Pacific Int. Symp. Basics Appl. Plasma Technology (APSPT-7)",
  year="2012",
  pages="1--4"
}