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SEDLÁKOVÁ, V.; ŠIKULA, J.; CHVÁTAL, M.; PAVELKA, J.; TACANO, M.; TOITA, M.
Original Title
Noise in Submicron Metal-Oxide-Semiconductor Field Effect Transistors: Lateral Electron Density Distribution and Active Trap Position
English Title
Type
WoS Article
Original Abstract
Experiments were carried out for the n-channel devices, processed in a 0.3 um spacer less Complementary Metal–Oxide–Semiconductor technology. Random-Telegraph-Signal measurements were performed for the constant gate voltage. It is supposed that electron concentration in the channel decreases from the source to the drain contact. Lateral component of the electric field is inhomogeneous in the channel and it has a minimum value near the source and reaching the maximum value near the drain electrode. Drain current is given by two components – diffusion and drift ones. Diffusion current component is independent on the x-coordinate and it is equal to the drift current component for the low electric field. The model explaining the experimentally observed capture time constant dependence on the lateral electric field and the trap position is given. From the dependence of the capture time constant tc on the drain current could be calculated x-coordinate of the trap position.
English abstract
Keywords
RANDOM TELEGRAPH SIGNALS; LOW-FREQUENCY NOISE; RTS NOISE; GATE OXIDE; MOSFETS; FLUCTUATIONS; EXTRACTION; MOBILITY; CURRENTS; DEFECTS
Key words in English
Authors
RIV year
2013
Released
07.02.2012
Publisher
The Japan Society of Applied Physics
Location
Japonsko
ISBN
0021-4922
Periodical
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
2012 (51)
Number
1
State
Japan
Pages from
024105-1
Pages to
024105-5
Pages count
5