Publication detail

Technical features of creation new synthesis technologies of nano-, micro- and monocrystalline SiC film at 1000 oC

BILALOV, B. SAFARALIEV, G. KARDASHOVA, G. SOBOLA, D. EUBOV, S.

Original Title

Technical features of creation new synthesis technologies of nano-, micro- and monocrystalline SiC film at 1000 oC

English Title

Technical features of creation new synthesis technologies of nano-, micro- and monocrystalline SiC film at 1000 oC

Type

conference paper

Language

Russian

Original Abstract

This study describes the formation problems of nano-, micro- and monocrystalline SiC films. The influence of main parameters of magnetron sputtering is investigated.

English abstract

This study describes the formation problems of nano-, micro- and monocrystalline SiC films. The influence of main parameters of magnetron sputtering is investigated.

Keywords

thin films, pressure, temperature, discharge current, deposition

Key words in English

thin films, pressure, temperature, discharge current, deposition

Authors

BILALOV, B.; SAFARALIEV, G.; KARDASHOVA, G.; SOBOLA, D.; EUBOV, S.

Released

23. 3. 2011

Publisher

Dagestan State University

Location

Machachkala

Pages from

116

Pages to

118

Pages count

2

URL

BibTex

@inproceedings{BUT76534,
  author="Bilal {Bilalov} and Gadjimet {Safaraliev} and Gulnara {Kardashova} and Dinara {Sobola} and Samur {Eubov}",
  title="Technical features of creation new synthesis technologies of nano-, micro- and monocrystalline SiC film at 1000 oC",
  booktitle="International conference INNOVATIKA 2011",
  year="2011",
  number="1",
  pages="116--118",
  publisher="Dagestan State University",
  address="Machachkala",
  url="http://www.ulsu.ru"
}