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STUDÝNKA, J.; ČECH, V.
Original Title
Aging of silicon-based dielectric coatings deposited by plasma polymerization
English Title
Type
Abstract
Original Abstract
Silicon-based dielectric coatings were deposited from tetravinylsilane or a mixture of tetravinylsilane with oxygen gas by pulsed plasma. The coatings in the form of a-SiC:H or a-SiOC:H alloy were stored at ambient conditions for 800 h to investigate aging effects. The SiH, SiC, and CHx species in the plasma polymer film were identified as responsible for strong oxidation of the deposited material. The increased oxygen concentration up to 19 at.% in the dielectric coatings resulted in a decrease of the refractive index. Oxygen concentrations >10 at.% resulted in reduction of mechanical properties of dielectric coatings deposited at powers ? 2.5 W. Suitable deposition conditions were deduced to reduce aging effects.
English abstract
Keywords
Thin film; PECVD; Aging; FTIR, Ellipsometry
Key words in English
Authors
RIV year
2010
Released
22.12.2009
Book
Book of Abstracts, TACT2009 Int. thin film conference, Taipei
Pages from
1
Pages to
Pages count
BibTex
@misc{BUT60920, author="Jan {Studýnka} and Vladimír {Čech}", title="Aging of silicon-based dielectric coatings deposited by plasma polymerization", booktitle="Book of Abstracts, TACT2009 Int. thin film conference, Taipei", year="2009", pages="1--1", note="Abstract" }