Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

Abstract

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.

Thin films, optical parameters

Thin films, optical parameters

OHLÍDAL, M.; OHLÍDAL, I.; KLAPETEK, P.; NEČAS, D.

2010

29.06.2008

Trinity College Dublin

Dublin

M-P43

M-P43

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