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Detail publikačního výsledku
HRUŠKA, P.; GRMELA, L.
Original Title
Silicon-silicon dioxide nanostructure in electrostatic field
English Title
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
Paper presents a numerical analysis of quantum states and probability function of a Si-SiO2 nanostructure in varying electrostatic field. The position of probability function peak is traced, and bias, under which it abandons the structure is determined. Variation of the ground state energy with the bias is also examined. The Poisson-Schrodinger model of Comsol Multiphysics program is devised and employed. The results would help understanding the electronic properties and behavior ultrascaled Si-SiO2 memory devices utilizing semiconducting quantum dots and Si single nanocrystals, to mention only one application.
English abstract
Keywords
nanostructure, Si-SiO2 quantum dot, discharging bias, poisson-Schrödinger numerical analysis, Comsol Multiphysics
Key words in English
Authors
RIV year
2011
Released
14.09.2010
Publisher
TU Košice
Location
Košice
ISBN
1335-8243
Periodical
Acta Electrotechnica et Informatica
Volume
10
Number
3
State
Slovak Republic
Pages from
22
Pages to
25
Pages count
4
Full text in the Digital Library
http://hdl.handle.net/
BibTex
@article{BUT50849, author="Pavel {Hruška} and Lubomír {Grmela}", title="Silicon-silicon dioxide nanostructure in electrostatic field", journal="Acta Electrotechnica et Informatica", year="2010", volume="10", number="3", pages="22--25", issn="1335-8243" }