Publication detail

Diffusion in Al-Ni and Al-NiCr Interfaces at Moderate Temperatures

ČELKO, L. KLAKURKOVÁ, L. ŠVEJCAR, J.

Original Title

Diffusion in Al-Ni and Al-NiCr Interfaces at Moderate Temperatures

Type

journal article - other

Language

English

Original Abstract

The diffusion couples for experimental study were prepared by HVOF spraying of nickel and nickel with 20wt.% of chromium powders onto the aluminium steet s surface. The interfaces with sharp gradient of chemical concentration of these elements were prepared. Annealing at the temperatures 600oC and 630oC, close to the Al+Al3Ni eutectic melting point (639,9oC), with different dwell times were realized. The reactants during the annealing diffuse and create layers of Al3Ni2 and Al3Ni intermediate phase compositions. Moreover, nickel without assistance of chromium diffuses preferably by using grain boundaries into aluminium substrate and produces the strengthening of the substrate by stable Al3Ni and metastable Al9Ni2 particles. The microstructures were obtained by scanning electron microscope. Layer theckness measurements were realized by means of image analyses. Chemical composition was estimated by energy dispersive microanalysis measurements. According to the results of these analyses performed the average chemical interdiffusion coefficients and Wagner s integral interdiffusion coefficients were calculated.

Keywords

diffusion; Al-Ni; Al-NiCr; aluminides

Authors

ČELKO, L.; KLAKURKOVÁ, L.; ŠVEJCAR, J.

RIV year

2010

Released

1. 3. 2010

Publisher

Trans Tech Publications

Location

Switzerland

ISBN

1012-0386

Periodical

Defect and Diffusion Forum

Year of study

297-301

Number

2010

State

Swiss Confederation

Pages from

771

Pages to

777

Pages count

7

URL

BibTex

@article{BUT47941,
  author="Ladislav {Čelko} and Lenka {Klakurková} and Jiří {Švejcar}",
  title="Diffusion in Al-Ni and Al-NiCr Interfaces at Moderate Temperatures",
  journal="Defect and Diffusion Forum",
  year="2010",
  volume="297-301",
  number="2010",
  pages="771--777",
  doi="10.4028/www.scientific.net/DDF.297-301.771",
  issn="1012-0386",
  url="http://www.scientific.net/DDF.297-301.771"
}