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MAŠEK, K.; VÁCLAVŮ, M.; BÁBOR, P.; MATOLÍN, V.
Original Title
Sn-CeO2 thin films prepared by rf magnetron sputtering: XPS and SIMS study
English Title
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
Sn addition in the CeO2 thin film by simultaneous Sn metal and cerium oxide magnetron sputtering causes growth of Ce3+ rich films whilst pure cerium oxide sputtering provides stoichiometric CeO2 layers. Ce4+ - Ce3+ conversion is explained by a charge transfer from Sn atoms to unoccupied orbital Ce 4f0 of cerium oxide by forming Ce 4f1 state. XPS and SIMS revealed a formation of a new chemical Ce(Sn)+ state, which belongs to SnCeO2 species.
English abstract
Keywords
Cerium oxide; Tin-cerium mixed oxide; SIMS; XPS; Magnetron sputtering
Key words in English
Authors
RIV year
2010
Released
15.04.2009
ISBN
0169-4332
Periodical
APPLIED SURFACE SCIENCE
Volume
255
Number
13-14
State
Kingdom of the Netherlands
Pages from
6656
Pages to
6660
Pages count
5
BibTex
@article{BUT47187, author="Karel {Mašek} and Michal {Václavů} and Petr {Bábor} and Vladimír {Matolín}", title="Sn-CeO2 thin films prepared by rf magnetron sputtering: XPS and SIMS study", journal="APPLIED SURFACE SCIENCE", year="2009", volume="255", number="13-14", pages="6656--6660", issn="0169-4332" }