Publication result detail

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

VOBORNÝ, S.; MACH, J.; ČECHAL, J.; KOSTELNÍK, P.; TOMANEC, O.; BÁBOR, P.; SPOUSTA, J.; ŠIKOLA, T.

Original Title

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

English Title

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Type

Peer-reviewed article not indexed in WoS or Scopus

Original Abstract

Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

English abstract

Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Key words in English

Ga, GaN, deposition, XPS

Authors

VOBORNÝ, S.; MACH, J.; ČECHAL, J.; KOSTELNÍK, P.; TOMANEC, O.; BÁBOR, P.; SPOUSTA, J.; ŠIKOLA, T.

RIV year

2011

Released

01.01.2004

ISBN

0447-6441

Periodical

Jemná mechanika a optika

Volume

9

Number

9

State

Czech Republic

Pages from

265

Pages count

5

BibTex

@article{BUT42366,
  author="Stanislav {Voborný} and Jindřich {Mach} and Jan {Čechal} and Petr {Kostelník} and Ondřej {Tomanec} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}",
  title="Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth",
  journal="Jemná mechanika a optika",
  year="2004",
  volume="9",
  number="9",
  pages="5",
  issn="0447-6441"
}